Effect of thermal treatments on the structure of MoNxOy thin films

• Author(s): Cunha, L. ; Rebouta, L. ; Vaz, F. ; Staszuk, M. ; Malara, S. ; Barbosa, José Gusman ; Carvalho, P. ; Alves, E. ; Le Bourhis, E. ; Goudeau, Ph. ; Rivière, J. P.
• Date: 2008
• Persistent ID: http://hdl.handle.net/1822/13841
• Origin: RepositóriUM - Universidade do Minho
• Subject(s): MoNxOy; Structure; Annealing
• Document Type: Article
• Language: English

Description

Article in Press MoNxOy films were deposited on steel substrates by dc reactive magnetron sputtering. The depositions were carried out from a pure molybdenum target, varying the flow rate of reactive gases. X-ray diffraction (XRD) results revealed the occurrence of cubic MoNx and hexagonal (d-MoN) phases for the films with high nitrogen flow rates. The increase of oxygen content induces the decrease of the grain size of the molybdenum nitride crystallites. The thermal stability of a set of samples was studied in vacuum, for an annealing time of 1 h, for temperatures ranging from 500 to 800 C in 100 C steps. The results showed that pure molybdenum nitride films changed their structure from a meta-stable cubic MoN to hexagonal d-MoN and cubic g-Mo2N-type structures with increasing annealing temperatures. The samples with molybdenum nitride films evidenced a good thermal stability, but those with molybdenum oxynitride coatings showed a tendency to detach with the increase of the annealing temperature.