Properties of MoNxOy thin films as a function of N/O ratio

• Autor(es): Barbosa, José Gusman ; Cunha, L. ; Rebouta, L. ; Moura, C. ; Vaz, F. ; Carvalho, S. ; Alves, E. ; Le Bourhis, E. ; Goudeau, Ph. ; Rivière, J. P.
• Data: 2006
• Identificador Persistente: http://hdl.handle.net/1822/3815
• Origem: RepositóriUM - Universidade do Minho
• Assunto(s): Molybdenum oxynitride; Physical vapour deposition
• Tipo de Documento: Artigo
• Idioma: Inglês

Descrição

The main purpose of this work consists on the preparation of single layered molybdenum oxynitride, MoNxOy. The films were deposited on steel substrates by dc reactive magnetron sputtering. The depositions were carried out from a pure Mo target varying the flow rate of reactive gases, which allowed tune the crystallographic structure between insulating oxides and metallic nitrides and consequently electronic, mechanical and optical properties of the material. X-ray diffraction (XRD) results revealed the occurrence of molybdenum nitride for the films with low oxygen fraction: face-centred cubic phases (gama-Mo2N) for low nitrogen flow rate or cubic MoNx and hexagonal phase (delta-MoN) for high nitrogen flow rate. The increase of oxygen content induces an amorphization of the nitride phases and appearance of MoO3 phases. The increase of the oxygen fraction in the films induces also a high decrease in films hardness. Residual stresses revealed to be of compressive type, in the range of very few tenths of GPa to 2 GPa. All these results have been analysed and will be presented as a function of the deposition parameters, the chemical composition and the structure of the films.