Document details

Modelling the influence of frequency in a low pressure capacitively coupled hyd...

Author(s): Marques, L. cv logo 1 ; Jolly, Jacques cv logo 2 ; Gousset, G. cv logo 3 ; Alves, L. L. cv logo 4

Date: 2002

Persistent ID: http://hdl.handle.net/1822/3016

Origin: RepositóriUM - Universidade do Minho

Subject(s): Capacitively coupled discharge; Hydrogen plasma


Description
This paper investigates the dependence of plasma density and self-bias voltage with excitation frequency (13.56-40.68 MHz) using a two-dimensional (2D) fluid model in a low pressure (300 mTorr) radio frequency (RF) capacitively coupled hydrogen discharge. A comparison with experimental results reveals that the model predicts the correct trends of density and self-bias voltage variation with driving frequency
Document Type Article
Language English
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