Crystal size and crystalline volume fraction effects on the Erbium emission of ...

• Autor(es): Cerqueira, M. F. ; Stepikhova, M. ; Kozanecki, A. ; Andrês, G. ; Alves, E.
• Data: 2010
• Identificador Persistente: http://hdl.handle.net/1822/13752
• Origem: RepositóriUM - Universidade do Minho
• Assunto(s): Nanocrystalline silicon; Erbium doping; Erbium emission
• Tipo de Documento: Artigo
• Idioma: Inglês

Descrição

Erbium-doped low-dimensional Si films with different microstructures were grown by reactive magnetron sputtering on glass substrates by varying the deposition parameters. Their structure and chemical composition were studied by micro-Raman and Rutherford backscattering spectrometry, respectively. In this contribution the Erbium emission is studied as a function of nanocrystalline fraction and average crystal sizes and also as a function of the matrix chemical composition. We discuss the temperature dependence of the Er3+ emission as well as the possible explanations of the low Er active fraction.