Document details

Optimization and thermal stability of TiAlN-Mo multilayers

Author(s): Tavares, C. J. cv logo 1 ; Vidrago, C. cv logo 2 ; Rebouta, L. cv logo 3 ; Le Bourhis, E. cv logo 4 ; Rivière, J. P. cv logo 5 ; Denanot, M. F. cv logo 6

Date: 2005

Persistent ID: http://hdl.handle.net/1822/4640

Origin: RepositóriUM - Universidade do Minho

Subject(s): Multilayers; Thermal Stability; Hardness; Stress; Roughness; Interdiffusion


Description
In this work we focus on the optimization and thermal stability of nanocomposite TiAlN/Mo multilayers that were produced by reactive magnetron sputtering on high-speed steel substrates, with modulation periods below 5 nm. These multilayers were annealed between 600– 900 ºC for 1 h in a vacuum furnace. Preliminary X-ray diffraction results reveal that these coatings are very stable up to 900 ºC, since the multilayer chemical modulation is not severely affected. At intermediate annealing temperatures the modulation period decreases due to interdiffusion at the interface, resulting in a thicker interface between metal/nitride and hence decreasing the thickness of those layers.
Document Type Article
Language English
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Fundação para a Ciência e a Tecnologia Universidade do Minho   Governo Português Ministério da Educação e Ciência Programa Operacional da Sociedade do Conhecimento EU