Properties changes of Ti(C, O, N) films prepared by PVD : the effect of reactiv...

• Author(s): Cunha, L. ; Moura, C. ; Vaz, F. ; Chappé, J. M. ; Olteanu, C. ; Munteanu, D. ; Munteanu, A.
• Date: 2009
• Persistent ID: http://hdl.handle.net/1822/13699
• Origin: RepositóriUM - Universidade do Minho
• Subject(s): Reactive sputtering; Titanium oxycarbonitride; Decorative properties
• Document Type: Article
• Language: English

Description

Dark Ti-C-O-N thin films were deposited by dc reactive magnetron sputtering. A titanium target was sputtered while three different gas flows were injected into the deposition chamber: argon (working gas), acetylene and a mixture of oxygen and nitrogen (reactive gases). The films were produced with variation of the gases flow rates, maintaining the remaining parameters constant. Varying the ratio between the reactive gases flow (gas mixture/acetylene) allowed obtaining films with different characteristics. The colour of the films was characterized by spectral reflectance spectroscopy, and expressed in the CIE 1976 L*a*b* colour space. An accurate control of the deposition conditions allowed obtaining intrinsic and stable dark colours for decorative applications. Composition analysis by electron probe microanalysis was done to quantify the elemental concentrations in the films. X-ray diffraction experiments revealed the evolution of the film structure which showed to be essentially amorphous, but with evidences of fcc structure.