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Tribological characterisation of magnetron sputtered Ti(C, O, N) thin films
Olteanu, C.; Munteanu, D.; Ionescu, C.; Munteanu, A.; Chappé, J. M.; Cunha, L.; Vaz, F.Ti(C, O, N) thin films were prepared by magnetron sputtering and analysed in terms of their tribological properties. Surface and tribological parameters were analysed and discussed as a function of the films composition and structural features, as well as their thickness. The evolution of friction coefficient values was in concordance with the wear behaviour of the films. According to the atomic composition of ...
Properties changes of Ti(C, O, N) films prepared by PVD : the effect of reactiv...
Cunha, L.; Moura, C.; Vaz, F.; Chappé, J. M.; Olteanu, C.; Munteanu, D.; Munteanu, A.Dark Ti-C-O-N thin films were deposited by dc reactive magnetron sputtering. A titanium target was sputtered while three different gas flows were injected into the deposition chamber: argon (working gas), acetylene and a mixture of oxygen and nitrogen (reactive gases). The films were produced with variation of the gases flow rates, maintaining the remaining parameters constant. Varying the ratio between the rea...
Influence of composition and structural properties in the tribological behaviou...
Munteanu, D.; Ionescu, C.; Olteanu, C.; Munteanu, A.; Davin, F.; Cunha, L.; Moura, C.; Vaz, F.Article in press ; Within the frame of this work, low temperature Ti–Si–C films were deposited on high-speed steel and stainless steel substrates by combined dc/rf magnetron co-sputtering. Composition analysis revealed the existence of two distinct regions: (i) a silicon doped sub-stoichiometric titanium carbide zone and (ii) a titanium rich zone. Structural analysis confirmed the different nature of the prepa...
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