Reactive magnetron sputtering was used to obtain dark Ti(C,O,N) decorative coatings onto high speed steel. From a crystallographic point of view, depending by the amount of (N+O) mixture, the obtained films could be divided in two major regions: the first one with a predominant fcc crystallographic structure (for low amounts of (N+O)), and the second one containing films with amorphous structures. The best resu...
The evolution of the nanoscale structure and the chemical bonds formed in Ti–C–N–O films grown by reactive sputtering were studied as a function of the composition of the reactive atmosphere by increasing the partial pressure of an O2+N2 gas mixture from 0 up to 0.4 Pa, while that of acetylene (carbon source) was constant. The amorphisation of the films observed by transmission electron microscopy was confirmed...
Ti(C, O, N) thin films were prepared by magnetron sputtering and analysed in terms of their tribological properties. Surface and tribological parameters were analysed and discussed as a function of the films composition and structural features, as well as their thickness. The evolution of friction coefficient values was in concordance with the wear behaviour of the films. According to the atomic composition of ...
This work reports on the study of thermal stability of dark decorative Ti(C,O,N) thin films produced by reactive magnetron sputtering, from a pure titanium target, using acetylene and an oxygen and nitrogen mixture as reactive gases. The thermal resistance and evolution of structural and physical properties were studied by performing annealing experiments at three different temperatures: 800, 900 and 1 000 ºC. ...
Dark Ti-C-O-N thin films were deposited by dc reactive magnetron sputtering. A titanium target was sputtered while three different gas flows were injected into the deposition chamber: argon (working gas), acetylene and a mixture of oxygen and nitrogen (reactive gases). The films were produced with variation of the gases flow rates, maintaining the remaining parameters constant. Varying the ratio between the rea...
In this work the oxidation resistance of DC reactive sputtered niobium oxynitrides and its influence on the properties of the films are studied. The depositions have been carried out by DC magnetron sputtering with a reactive gas pulsing process. The nitrogen flow was kept constant and the oxygen flow was pulsed. Pulse durations of 10 s produced multilayer coatings with a period of [lambda] = 10 nm. Three sets ...
Accepted manuscript ; Direct current reactive magnetron sputtering was implemented to successfully deposit dark Ti(C,O,N) thin films on silicon substrates. A titanium target was sputtered while a mixture of oxygen and nitrogen was injected into the deposition chamber, independently from an acetylene source. The deposition parameters were chosen as a function of pre-existing knowledge about sputtered Ti–O–N and...
This work is devoted to the investigation of decorative zirconium oxynitride, ZrOxNy, films prepared by dc reactive magnetron sputtering, using a 17:3 nitrogen-to-oxygen-ratio gas mixture. The color of the films changed from metallic-like, very bright yellow pale, and golden yellow, for low gas mixture flows [from 0 to about 9 SCCM (SCCM denotes cubic centimeter per minute at STP)] to red brownish for intermedi...
As a result of technological progress in recent years, a new challenge was passed onto decorative hard coatings. While enhancing the appearance and lending attractive coloration to surfaces, the films are supposed to provide scratch resistance, protection against corrosion and durability. For this work, TiN(O) and TiN(C,O) thin films were prepared. Within the TiN(O) system, film colours varied from the glossy g...
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