Structural stability of decorative ZrNxOy thin films

• Author(s): Carvalho, P. ; Vaz, F. ; Rebouta, L. ; Carvalho, S. ; Cunha, L. ; Goudeau, Ph. ; Rivière, J. P. ; Alves, E. ; Cavaleiro, A.
• Date: 2005
• Persistent ID: http://hdl.handle.net/10316/4236
• Origin: Estudo Geral - Universidade de Coimbra
• Subject(s): Sputtering; Zirconium nitride; Thermal degradation
• Document Type: Article
• Language: English

Description

ZrNxOy thin films were prepared by rf reactive magnetron sputtering. The thermal stability of the coatings was tested in vacuum for an annealing time of 1 h in the temperature range 400-800 °C. Residual stresses originated by the deposition process were partially or almost completely released with the annealing, which is consistent with the X-ray diffraction results. Samples with low oxygen fraction (0.10 < fO2 < 0.22) showed no significant changes in hardness after thermal annealing at 800 °C. For intermediate and high oxygen fractions, an initial decrease in hardness at 600 °C annealing is followed by an inversion at the highest temperatures (700 and 800 °C, respectively), resulting from possible oxide phases crystallization, defect annealing at high temperatures and some extended phase segregations. The increase in the oxygen fraction is followed by a decrease of hardness in the as-deposited samples towards the values of "pure" ZrO2. No significant changes in colour were observed with the annealing. http://www.sciencedirect.com/science/article/B6TVV-4FS5YPV-6/1/3a4740da72d3213b5aabce97eb98cfdf