Structural evolution in ZrNxOy thin films as a function of temperature

• Autor(es): Cunha, L. ; Vaz, F. ; Moura, C. ; Rebouta, L. ; Carvalho, P. ; Alves, E. ; Cavaleiro, A. ; Goudeau, Ph. ; Rivière, J. P.
• Data: 2006
• Identificador Persistente: http://hdl.handle.net/10316/4230
• Origem: Estudo Geral - Universidade de Coimbra
• Assunto(s): Zirconium oxynitride; PVD coatings; Decorative coatings; Heat treatment
• Tipo de Documento: Artigo
• Idioma: Inglês

Descrição

Single-layered zirconium oxynitride (ZrNxOy) thin films have been deposited on steel substrates, at a constant temperature of 300 °C, by radiofrequency (rf) reactive magnetron sputtering of a pure Zr target in an argon-oxygen-nitrogen atmosphere. The variation of the flow rate of the reactive gases enabled changes in the composition and structure of the films. X-ray diffraction (XRD) and glancing incidence X-ray diffraction (GIXRD) were used to study the as-deposited films and their structural changes during or after heat treatment, from 400 to 900 °C, in controlled atmosphere and in vacuum. http://www.sciencedirect.com/science/article/B6TVV-4DPYN97-6/1/3785b40b130ad12af7221c230d2968cf