Author(s):
Polyakov, A. ; Sinaga, S. M.
; Mendes, P. M.
; Bartek, M.
; Correia, J. H.
; Burghartz, J. N.
Date: 2004
Persistent ID: http://hdl.handle.net/1822/4880
Origin: RepositóriUM - Universidade do Minho
Subject(s): Polycrystalline silicon; Wafer-level packaging; High-resistivy silicion substrate; Integrated passives; Dielectric losses; Substrate transfer; RF applications