Microstructure and thermal features of a-si:h and nc-si:h thin films ...

• Author(s): Thaiyalnayaki, V. ; Cerqueira, M. F. ; Macedo, Francisco ; Ferreira, J. A.
• Date: 2006
• Persistent ID: http://hdl.handle.net/1822/13970
• Origin: RepositóriUM - Universidade do Minho
• Subject(s): Nanocrystalline silicon; Thermal properties; Structure
• Document Type: Article
• Language: English

Description

Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X-ray diffraction and the thermal transport parameters