Hydrogenated nanocrystalline silicon thin films were prepared by RF magnetron sputtering. Different bias fields (no bias–no ground, grounded and negative bias) were applied to the substrate. The effect of the ion bombardment on the structure, chemical composition and optical property were studied by Raman spectroscopy, X-ray diffraction, Rutherford backscattering (RBS) and optical transmission spectroscopy. The...
Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X-ray diffraction and the thermal transport parameters
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