Microstructure and thermal features of a-si:h and nc-si:h thin films ...

• Autor(es): Thaiyalnayaki, V. ; Cerqueira, M. F. ; Macedo, Francisco ; Ferreira, J. A.
• Data: 2006
• Identificador Persistente: http://hdl.handle.net/1822/13970
• Origem: RepositóriUM - Universidade do Minho
• Assunto(s): Nanocrystalline silicon; Thermal properties; Structure
• Tipo de Documento: Artigo
• Idioma: Inglês

Descrição

Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X-ray diffraction and the thermal transport parameters