The annealing effect on structural and optical properties of ZnO thin films pro...

• Author(s): Rolo, Anabela G. ; Campos, J. Ayres de ; Viseu, T. M. R. ; Arôso, T. de Lacerda ; Cerqueira, M. F.
• Date: 2007
• Persistent ID: http://hdl.handle.net/1822/13774
• Origin: RepositóriUM - Universidade do Minho
• Subject(s): ZnO; Thin films; X-ray; Raman; Stress
• Document Type: Article
• Language: English

Description

In this work, a study of the structure and optical properties of undoped ZnO thin films produced by r.f. magnetron sputtering technique as a function of the growth parameters is reported. Modification under annealing conditions is also analysed. Raman spectroscopy, X-ray photoelectron spectroscopy, X-ray diffraction and optical transmittance have been used. From the position of the (002) X-ray diffraction peak and the E2 (high) mode detected in Raman spectra, the residual stress both in the as-grown and in the annealed samples has been estimated.