(Ti,Si,Al)N nanocomposite coatings with different Ti, Si, Al contents, were deposited onto silicon and polished high-speed steel substrates, by r.f. and/or d.c. reactive magnetron sputtering. The stoichiometry of the films was investigated by electron probe microanalysis and Rutherford backscattering spectrometry (RBS). The density was derived by combination of RBS results and thickness measurements obtained by...
Ti1yxSixNy films with Si contents up to 17.5 at.% and N contents close to 50 at.% were prepared by r.f. reactive magnetron sputtering. Film densities are within the range 3.4–5.1 gycm3.X-Ray diffraction patterns indicated the formation of two crystalline phases.In the case of low surface mobility, a metastable (Ti, Si)N phase was formed, where Si atoms occupied Ti positions. With increasing surface mobility, a ...
(Ti,Al,Si)N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents in the range 2-11 at.% and Al contents between 4 and 19 at.%. Samples prepared in rotation mode (three magnetrons) presented densities between 4.0 and 4.6 g/cm3, while samples prepared in static mode (magnetron with Ti target with small pieces of Si and Al) displayed densities mainly in the range 3.0-3.9 g/cm3. F...
ŽTi,Al,Si.N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents in the range 2 11 at.% and Al contents between 4 and 19 at.%. Samples prepared in rotation mode Žthree magnetrons. presented densities between 4.0 and 4.6 g cm3, while samples prepared in static mode Žmagnetron with Ti target with small pieces of Si and Al. displayed densities mainly in the range 3.0 3.9 g cm3. F...
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