Encontrados 4 documentos, a visualizar página 1 de 1

Ordenado por Data

Structure and chemical bonds in reactively sputtered black Ti–C–N–O thin films

Chappé, J. M.; Marco de Lucas, M. C.; Cunha, L.; Moura, C.; Pierson, J. F.; Imhoff, L.; Heintz, O.; Potin, V.; Bourgeois, S.; Vaz, F.

The evolution of the nanoscale structure and the chemical bonds formed in Ti–C–N–O films grown by reactive sputtering were studied as a function of the composition of the reactive atmosphere by increasing the partial pressure of an O2+N2 gas mixture from 0 up to 0.4 Pa, while that of acetylene (carbon source) was constant. The amorphisation of the films observed by transmission electron microscopy was confirmed...


Development of dark Ti(C,O,N) coatings prepared by reactive sputtering

Chappé, J. M.; Vaz, F.; Cunha, L.; Moura, C.; Marco de Lucas, M. C.; Imhoff, L.; Bourgeois, S.; Pierson, J. F.

Accepted manuscript ; Direct current reactive magnetron sputtering was implemented to successfully deposit dark Ti(C,O,N) thin films on silicon substrates. A titanium target was sputtered while a mixture of oxygen and nitrogen was injected into the deposition chamber, independently from an acetylene source. The deposition parameters were chosen as a function of pre-existing knowledge about sputtered Ti–O–N and...


Property change in multifunctional TiCxOy thin films: Effect of the O/Ti ratio

Fernandes, A. C.; Carvalho, P.; Vaz, F.; Lanceros-Méndez, S.; Machado, A. V.; Parreira, N. M. G.; Pierson, J. F.; Martin, N.

TiCxOy films with various O/Ti ratios have been deposited by DC magnetron sputtering, using C pieces incrusted in a Ti target erosion area. Composition analysis revealed the existence of three different growth regimes: (i) zone I, corresponding to films with metallic-like appearance, and atomic ratios O/Ti below one; (ii) zone II, with films revealing interference-like colours, and atomic ratios O/Ti higher tha...


Effect of germanium addition on the properties of reactively sputtered ZrN films

Pilloud, D.; Pierson, J. F.; Cavaleiro, A.; Lucas, M. C. Marco de

For the first time, Zr-Ge-N films were deposited on silicon and steel substrates by sputtering a Zr-Ge composite target in reactive Ar-N2 mixture. The films were characterised by electron probe microanalysis, X-ray diffraction, micro-Raman spectroscopy and depth-sensing indentation. The effects of the Ge content and substrate bias voltage on the films' structure, internal stress, hardness and oxidation resistan...


4 Resultados

Texto Pesquisado

Refinar resultados

Autor











Data





Tipo de Documento


Recurso



Assunto















    Financiadores do RCAAP

Fundação para a Ciência e a Tecnologia Universidade do Minho   Governo Português Ministério da Educação e Ciência Programa Operacional da Sociedade do Conhecimento União Europeia