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Ti–Si–C thin films produced by magnetron sputtering : correlation between physi...
Cunha, L.; Vaz, F.; Moura, C.; Munteanu, D.; Ionescu, C.; Rivière, J. P.; Le Bourhis, E.Ti–Si–C thin films were deposited onto silicon, stainless steel and high-speed steel substrates by magnetron sputtering, using different chamber configurations. The composition of the produced films was obtained by Electron Probe Micro-Analysis (EPMA) and the structure by X-ray diffraction (XRD). The hardness and residual stresses were obtained by depth-sensing indentation and substrate deflection measurements ...
Tribological characterisation of magnetron sputtered Ti(C, O, N) thin films
Olteanu, C.; Munteanu, D.; Ionescu, C.; Munteanu, A.; Chappé, J. M.; Cunha, L.; Vaz, F.Ti(C, O, N) thin films were prepared by magnetron sputtering and analysed in terms of their tribological properties. Surface and tribological parameters were analysed and discussed as a function of the films composition and structural features, as well as their thickness. The evolution of friction coefficient values was in concordance with the wear behaviour of the films. According to the atomic composition of ...
Influence of composition and structural properties in the tribological behaviou...
Munteanu, D.; Ionescu, C.; Olteanu, C.; Munteanu, A.; Davin, F.; Cunha, L.; Moura, C.; Vaz, F.Article in press ; Within the frame of this work, low temperature Ti–Si–C films were deposited on high-speed steel and stainless steel substrates by combined dc/rf magnetron co-sputtering. Composition analysis revealed the existence of two distinct regions: (i) a silicon doped sub-stoichiometric titanium carbide zone and (ii) a titanium rich zone. Structural analysis confirmed the different nature of the prepa...
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