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Properties of tantalum oxynitride thin films produced by magnetron sputtering: ...
Cristea, D.; Constantin, D.; Crisan, A.; Abreu, C. S.; Gomes, J. R.; Barradas, N. P.; Alves, E.; Moura, C.; Vaz, F.; Cunha, L.The main purpose of this work is to present and to interpret the change of structure and physical properties of tantalum oxynitride (TaNxOy) thin films, produced by dc reactive magnetron sputtering, by varying the processing parameters. A set of TaNxOy films was prepared by varying the reactive gases flow rate, using a N2/O2 gas mixture with a concentration ratio of 17:3. The different films, obtained by this p...
Data: 2013
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Origem: Repositório Científico do Instituto Politécnico do Porto
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