The main purpose of this work is to present and to interpret the change of structure and physical properties of tantalum oxynitride (TaNxOy) thin films, produced by dc reactive magnetron sputtering, by varying the processing parameters. A set of TaNxOy films was prepared by varying the reactive gases flow rate, using a N2/O2 gas mixture with a concentration ratio of 17:3. The different films, obtained by this p...
Reactive magnetron sputtering was used to obtain dark Ti(C,O,N) decorative coatings onto high speed steel. From a crystallographic point of view, depending by the amount of (N+O) mixture, the obtained films could be divided in two major regions: the first one with a predominant fcc crystallographic structure (for low amounts of (N+O)), and the second one containing films with amorphous structures. The best resu...
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