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FEM numerical analysis of excimer laser induced modification in alternating mul...
Conde, J. C.; Martín, E.; Stefanov, S.; Chiussi, S.; Alpuim, P.UV excimer laser annealing (UV-ELA) is an alternative annealing process that, during the last few years, has gained enormous importance for the CMOS nano-electronic technologies, with the ability to provide films and alloys with electrical and optical properties to fit the desired device performance. The UV-ELA of amorphous (a-) and/or doped nano-crystalline (nc-) silicon films is based on the rapid (nanosecond...
Data: 2012
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Origem: RepositóriUM - Universidade do Minho
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