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Structure and chemical bonds in reactively sputtered black Ti–C–N–O thin films
Chappé, J. M.; Marco de Lucas, M. C.; Cunha, L.; Moura, C.; Pierson, J. F.; Imhoff, L.; Heintz, O.; Potin, V.; Bourgeois, S.; Vaz, F.The evolution of the nanoscale structure and the chemical bonds formed in Ti–C–N–O films grown by reactive sputtering were studied as a function of the composition of the reactive atmosphere by increasing the partial pressure of an O2+N2 gas mixture from 0 up to 0.4 Pa, while that of acetylene (carbon source) was constant. The amorphisation of the films observed by transmission electron microscopy was confirmed...
Development of dark Ti(C,O,N) coatings prepared by reactive sputtering
Chappé, J. M.; Vaz, F.; Cunha, L.; Moura, C.; Marco de Lucas, M. C.; Imhoff, L.; Bourgeois, S.; Pierson, J. F.Accepted manuscript ; Direct current reactive magnetron sputtering was implemented to successfully deposit dark Ti(C,O,N) thin films on silicon substrates. A titanium target was sputtered while a mixture of oxygen and nitrogen was injected into the deposition chamber, independently from an acetylene source. The deposition parameters were chosen as a function of pre-existing knowledge about sputtered Ti–O–N and...
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