Thin films of AlOxNy were deposited by magnetron sputtering in a wide composition range. Different structures and morphologies were observed, depending on the composition and bonding states, which opened the possibility to tailor the properties of this oxynitride system between those of pure Al and those of nitride and oxide films. In a wide range of stoichiometries, one can report the formation of nanocomposit...
Direct current magnetron sputtering was used to produce AlNxOy thin films, using an aluminum target, argon and a mixture of N2+O2 (17:3) as reactive gases. The partial pressure of the reactive gas mixture was increased, maintaining the discharge current constant. Within the two identified regimes of the target (metallic and compound), four different tendencies for the deposition rate were found and a morphologi...
Financiadores do RCAAP | |||||||
![]() |
![]() |
![]() |
![]() |
![]() |
![]() |