Author(s):
Rocha, R. P. ; Carmo, J. P.
; Correia, J. H.
; Gomes, J. M.
Date: 2012
Persistent ID: http://hdl.handle.net/1822/22051
Origin: RepositóriUM - Universidade do Minho
Subject(s): Microlenses array; Photolithography; Photoresist; Thermal reflow