Detalhes do Documento

A new interlayer approach for CVD diamond coating of steel substrates

Autor(es): F. J. G. Silva cv logo 1 ; A.J.S. Fernandes cv logo 2 ; F.M. Costa cv logo 3 ; A. P. M. Baptista cv logo 4 ; E. Pereira cv logo 5

Data: 2004

Identificador Persistente: http://hdl.handle.net/10216/180

Origem: Repositório Aberto da Universidade do Porto


Descrição
A NiyCuyTi multilayer system is proposed to face the typical problems-related with direct diamond deposition on steel substrates, namely the lack of adhesion and growth rates.Systematic experimental work allowed achieving the best MPCVD parameter set in order to obtain both thin and thick diamond films (5–130 mm) with good morphology and adhesion with low residual stress level.In fact, a thick soft copper layer permits to accommodate the thermally-induced stresses during the cooling stage of MPCVD process, allowing good diamond film integrity.The films thus obtained are continuous and uniform, crack-free and well adhered as required in most mechanical applications.The characterization techniques were: Scanning electron microscopy (SEM) to observe morphology; m-Raman spectroscopy to check diamond film quality and stress state evaluation; X-ray diffraction to measure the residual stresses; micro-indentation to examine the diamond film adherence; profilometry to measure the surface roughness.
Tipo de Documento Artigo
Idioma Português
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Fundação para a Ciência e a Tecnologia Universidade do Minho   Governo Português Ministério da Educação e Ciência Programa Operacional da Sociedade do Conhecimento União Europeia