Detalhes do Documento

Positron annihilation and constant photocurrent method measurements on a-Si:H f...

Autor(es): Gordo, P. M. cv logo 1 ; Marques, M. F. Ferreira cv logo 2 ; Gil, C. Lopes cv logo 3 ; Lima, A. P. de cv logo 4 ; Lavareda, G. cv logo 5 ; Carvalho, C. Nunes de cv logo 6 ; Amaral, A. cv logo 7 ; Kajcsos, Zs. cv logo 8

Data: 2007

Identificador Persistente: http://hdl.handle.net/10316/4386

Origem: Estudo Geral - Universidade de Coimbra

Assunto(s): Variable-energy positron annihilation; Doppler broadening; Constant photocurrent method; Defects; Density of states


Descrição
Defect structure of hydrogenated amorphous silicon thin-films was studied by positron annihilation spectroscopy (PAS), whereas the density of states below the Fermi level was measured by constant photocurrent method (CPM). Divacancies and large vacancy clusters were identified as the main defects present in these films, with relative concentrations strongly dependent on the rf-power. Correlation between PAS, CPM results and I(V) characteristics of solar cells suggests the creation of energy levels above the Fermi energy, not observable by CPM, related to large vacancy clusters. http://www.sciencedirect.com/science/article/B6TVT-4JX373P-2/1/af7c69b0fdf17cefb2432fb357d5d86f
Tipo de Documento Artigo
Idioma Inglês
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