Physical and mechanical properties of Ti1 - xSixN films

• Autor(es): Vaz, F. ; Rebouta, L. ; Ramos, S. ; Cavaleiro, A. ; Silva, M. F. da ; Soares, J. C.
• Data: 1998
• Identificador Persistente: http://hdl.handle.net/10316/4327
• Origem: Estudo Geral - Universidade de Coimbra
• Assunto(s): Rutherford back-scattering spectrometry; Silicon; Titanium; X-ray diffraction
• Tipo de Documento: Artigo
• Idioma: Inglês

Descrição

Ti1 - xSixN coatings with 0 <- x <- 0.30 and thicknesses ranging from 1.2 to 3.3 [mu]m, were deposited on to polished high-speed steel substrates by r.f. reactive magnetron sputtering. The atomic composition of the samples was measured by Rutherford backscatering spectrometry (RBS), and the texture was determined by X-ray diffraction (XRD). Great improvements in hardness and adhesion behaviour were obtained when compared to TiN. Hardness results and adhesion behaviour as a function of the Si content will be shown and discussed. The Ti0.85Si0.15N sample presented the best results with a hardness value of about 36 GPa and a critical load for total failure around 70 N. http://www.sciencedirect.com/science/article/B6TVV-3TMWPHC-T/1/5b63de63f84a6eebf3669ec2ed9928ee