Nanocrystalline structure and hardness of thin films

• Autor(es): Cavaleiro, A. ; Louro, C.
• Data: 2002
• Identificador Persistente: http://hdl.handle.net/10316/4290
• Origem: Estudo Geral - Universidade de Coimbra
• Assunto(s): W-Si-N coatings; Hardness; Nanostructure; Sputtering
• Tipo de Documento: Artigo
• Idioma: Inglês

Descrição

W---Si---N films were deposited by reactive sputtering in a N2+Ar atmosphere from a W target incrusted with different number of Si pieces. The coatings present different crystallographic structures from the crystalline [alpha]-W and W2N to amorphous phase. Crystalline films have very low grain sizes from 15 down to 3 nm. http://www.sciencedirect.com/science/article/B6TW4-44PCFMC-6/1/9eb4f2ae932f9fa1dde3d75b37b5bb8e