Author(s):
Cavaleiro, A. 
; Louro, C.
Date: 2002
Persistent ID: http://hdl.handle.net/10316/4290
Origin: Estudo Geral - Universidade de Coimbra
Subject(s): W-Si-N coatings; Hardness; Nanostructure; Sputtering
Document details
Nanocrystalline structure and hardness of thin films
Description
W---Si---N films were deposited by reactive sputtering in a N2+Ar atmosphere from a W target incrusted with different number of Si pieces. The coatings present different crystallographic structures from the crystalline [alpha]-W and W2N to amorphous phase. Crystalline films have very low grain sizes from 15 down to 3 nm. http://www.sciencedirect.com/science/article/B6TW4-44PCFMC-6/1/9eb4f2ae932f9fa1dde3d75b37b5bb8e
W---Si---N films were deposited by reactive sputtering in a N2+Ar atmosphere from a W target incrusted with different number of Si pieces. The coatings present different crystallographic structures from the crystalline [alpha]-W and W2N to amorphous phase. Crystalline films have very low grain sizes from 15 down to 3 nm. http://www.sciencedirect.com/science/article/B6TW4-44PCFMC-6/1/9eb4f2ae932f9fa1dde3d75b37b5bb8e
Document Type
Article
Language English
Language English
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